Kifonix develops and delivers grayscale photomasks for microlithography applications to create 3D photoresist profiles with a single exposure. We take advantage of the advanced photomask writing capabilities, our expertise in fab's photoresist behavior / etching performance, and especially our gray cell computing algorithm.  Following are some key factors for success:

• 4 or 5x exposure tools
• Low contrast photoresists
• Device min unit size (eg 1 lens) is >5 µm